Ch 552 Technology of Photoresist
Modern semiconductor fabrication relies heavily on photoresists to fabricate integrated circuits (ICs) on a nanometer-length scale. Physics and chemistry of photoresists for modern lithography is the focus of the class, which will include numerical modeling of lithographic processing steps using Prolith software. The course will introduce the fundamental photochemistry and kinetics of image development for the current generation of Deep UV and chemically amplified resists for 193 nm and extreme UV lithographies.
Slash Listed Courses
Also offered for undergraduate-level credit as
Ch 452 and may be taken only once for credit.